Description | Grade Impurities (Gas Phase) |
Electronic 99.995% (N4.5) (Mol. PPM) |
VLSI 99.999% (N5.0) (Mol. PPM) |
Sigma 3 99.999% (N5.0) (Mol. PPM) |
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Hydrogen Chloride is a pungent, toxic, corrosive gas having a suffocating odour. It is heavier than air and fumes strongly in moist air. |
Nitrogen | < 16 | < 2 | < 2 |
Oxygen + Argon | < 5 | < 1 | < 1 | |
THC | < 54 | < 1 | < 1 | |
Carbon Dioxide | < 10 | < 8 | < 5 | |
Moisture | < 10 | < 3 | < 2 | |
CO | – | – | < 1 | |
Total Metals | – | < 10 ppmw | < 0.5 ppmw | |
Iron (Fe) | – | – | < 0.1 ppmw | |
Nickel (Ni) | – | – | < 0.05 ppmw | |
Chromium (Cr) | – | – | < 0.05 ppmw | |
Other Metals 1 | – | – | < 0.01 ppmw | |
1 Other metals include : Ca ,Cd, Co, Cu, K, Mg, Mn, Na, Pb, Zn |
Cylinder Size | Volume (Kg) | Cylinder Data | |
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B44st (A) | 27.3 | Supplied as a liquefied in seamless steel cylinders.
Standard sizes / Volumes as listed – |
|
B50st | 37 |
Phoenix Gases can supply any internationally recognised valve type. For Hydrogen Chloride standard internationalvalve types are as follows | |
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American | CGA 330 / DISS 634 |
European | DIN 477 – 8 |
Gas Data | |
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Mol. Weight | 36.461 |
Boiling Point | -85°C |
Density | 1.5 g/cm3 |
Vapour Pressure | 41.7 bar |
Recommended Regulator |
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Phoenix Gases recommends the use of manual or automatic gas cabinets for this product. Please contact us for further details. |
Typical Applications |
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Etching of native oxide prior to epitaxial deposition : CVD reactor cleaning, moisture scavenger in CVD oxides. |